OAI 5000E 光刻機(jī)
詳細(xì)介紹
型號(hào)5000E大面積光刻機(jī)用于基板和顯示器
OAI 5000E型大面積掩光刻機(jī)是一種*的高性能,全自動(dòng)掩模對(duì)準(zhǔn)器和曝光工具,可為大型平板應(yīng)用提供超精密,,亞微米對(duì)準(zhǔn)和分辨率。 其靈活的設(shè)計(jì)允許在各種基材(圓形或方形)上印刷高達(dá)300mm或20“×20”。 曝光系統(tǒng)兼容近,中,或深紫外范圍的光刻膠,并具有計(jì)算機(jī)控制的LED顯微鏡照明,在不太理想的觀察環(huán)境中觀察。
Model 5000E Large Area Mask Aligner for Substrates and Displays
The OAI Model 5000E Large Area Mask Aligner is an advanced, high-performance, fully-automated mask Aligner and exposure tool that delivers ultra precise, Topside, sub-micron alignment and resolution for large, flat panel applications. Its flexible design allows printing on various substrates - round or square - up to 300mm or 20”x20”. The exposure system is compatible with photo resist in Near, Mid, or Deep UV range, and features computer-controlled LED microscope lighting for viewing in less-than-ideal viewing environments.